Jochen Ritter
8Patents
6h-index
13Co-inventors
52Inventor score
Filing activity: Nov 4, 1988 → Mar 17, 1995
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5144196A | Particle source, especially for reactive ionic etching and plasma-supported CVD processes | Electricity | 55 | Expired |
| US5224202A | Apparatus for the evaporation of liquids | Chemistry; Metallurgy | 34 | Expired |
| US5318928A | Method for the surface passivation of sensors using an in situ sputter cleaning step prior to passivation film deposition | Emerging Cross-Sectional Technologies | 25 | Expired |
| US5069930A | Method for the evaporation of monomers that are liquid at room temperature | Chemistry; Metallurgy | 20 | Expired |
| US5423971A | Arrangement for coating substrates | Electricity | 19 | Expired |
| US4947789A | Apparatus for vaporizing monomers that flow at room temperature | Chemistry; Metallurgy | 16 | Expired |
| US5237152A | Apparatus for thin-coating processes for treating substrates of great surface area | Electricity | 5 | Expired |
| US5498291A | Arrangement for coating or etching substrates | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.