Photoresist article having a portable, conformable, built-on mask
US5240807A · kind A · utility
4Cited by
11References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 2, 1989 |
| Grant date | Aug 31, 1993 |
| Priority date | — |
| Expiry date | Aug 2, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A water soluble built-on mask layer is provided on a photoresist composition disposed on a substrate. The photoresist comprises an o-quinone diazide and a novolak or paravinyl phenol resin. The built-on mask layer comprises a water soluble, photobleachable diazonium salt, a coupler for the diazonium salt and an acidic, polymeric, film forming resin such as polystyrene sulfonic acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.