Method of forming oxide superconductor patterns
US5248663A · kind A · utility
3Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 1992 |
| Grant date | Sep 28, 1993 |
| Priority date | — |
| Expiry date | Mar 13, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/73
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a superconductor pattern in which at lest a pair of electrodes is formed on a substrate in spaced, facing relationship nd an oxide superconductor thin film having a unit lattice which assumes a laminar structure then is formed on the substrate, extending between and contacting the electrodes. The superconductor pattern obtained by this method suffers less degradation of the superconductor thin film, in comparison with that of patterns formed by the prior art methods, and the decrease of the critical current density as a function of increasing temperature is extremely small.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.