Process for imaging of photoresist including treatment of the photoresist with an organometallic compound
US5250395A · kind A · utility
19Cited by
14References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 25, 1991 |
| Grant date | Oct 5, 1993 |
| Priority date | — |
| Expiry date | Jul 25, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/265
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a process for negative tone imaging of photoresist to improve resolution of lithographic patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.