Device manufacture involving lithographic processing
US5258246A · kind A · utility
35Cited by
5References
39Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 1992 |
| Grant date | Nov 2, 1993 |
| Priority date | — |
| Expiry date | Jul 14, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31791
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons. Use of such masks is of value as applied to scanning systems providing for dynamic correction of aberrations by physical movement of or field shaping of the objective lens to maintain the optical axis coincident with the scanning information-scanning beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.