Device manufacture involving step-and-scan delineation
US5260151A · kind A · utility
80Cited by
1References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1991 |
| Grant date | Nov 9, 1993 |
| Priority date | — |
| Expiry date | Dec 30, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching"--positioning of projected segment images to yield a satisfactory continuous image--is aided by lithographically defined skirts forming a continuous border within strut-supported segments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.