Vapor deposition of parylene-F using 1,4-bis (trifluoromethyl) benzene
US5268202A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 9, 1992 |
| Grant date | Dec 7, 1993 |
| Priority date | — |
| Expiry date | Oct 9, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A PA-F polymer film is formed using a mixture of 1,4-bis (trifluoromethyl) benzene (TFB) and a halogen initiator. This mixture is provided to a low pressure reactor containing a metal catalyst. The reactor is operated at a sufficient temperature to form a reactive monomer by a chemical reaction at the surface of the catalyst. The reactive monomer is condensed on the surface of a substrate cooled to a temperature sufficiently low to induce polymerization of the reactive monomer to form a PA-F polymer film. In general, the proportion of halogen initiator is about 0.25 to 50% by volume relative to the total volume of the TFB/halogen initiator mixture. The reactor is operated at a temperature of about 200.degree. to 700.degree. C. and a pressure of less than about one torr. In addition, the surface of the substrate is maintained at a temperature of about -30.degree. C. to room temperature. In the preferred approach, the halogen initiator is dibromotetrafluoro-p-xylene (DBX) and the proportion of DBX is about 1 to 5%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.