Radiation-sensitive ester and process for its preparation

US5268252A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Siegfried Scheler · Wiesbaden, DE
• Wolfgang Zahn
• Axel Schmitt · Munich, DE
• Gerhard Buhr · Königstein, DE

Key dates

• Filing date: Apr 1, 1992
• Grant date: Dec 7, 1993
• Expiry date: Apr 1, 2012

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/022
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.