Siegfried Scheler
17Patents
4h-index
11Co-inventors
53Inventor score
Filing activity: Oct 13, 1978 → Dec 23, 1996
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4540648A | Two-component diazotype material with ultraviolet light-absorbing dye salt of a benzothiazole | Physics | 20 | Expired |
| US4492749A | Diazotype materials with 2-hydroxy-naphthalene having sulfonamide substituent as coupler | Physics | 12 | Expired |
| US5114816A | Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material | Chemistry; Metallurgy | 8 | Expired |
| US4334004A | Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid amides having 6-sulfonic acid amide substitution | Physics | 6 | Expired |
| US4457997A | Two-component diazotype material | Emerging Cross-Sectional Technologies | 3 | Expired |
| US4317875A | Recording material containing diazo compounds and process for the manufacture thereof | Emerging Cross-Sectional Technologies | 2 | Expired |
| US5082932A | Process for preparing substituted 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid esters and their use in a radiation-sensitive mixture | Physics | 2 | Expired |
| US5413899A | Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters | Physics | 2 | Expired |
| US4321373A | 2-Hydroxy-3-naphthoic acid amides | Physics | 2 | Expired |
| US4590143A | Two-component diazotype material with diazonium salt with anion of benzene or toluene sulfonate | Physics | 2 | Expired |
| US5563018A | (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material | Physics | 1 | Expired |
| US5834157A | 2-acylamino-9-arylacridines, process for their preparation and photosensitive mixtures containing them | Emerging Cross-Sectional Technologies | 1 | Expired |
| US5306595A | Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith | Physics | 1 | Expired |
| US5077395A | Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use | Physics | 1 | Expired |
| US5192640A | Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof | Chemistry; Metallurgy | 1 | Expired |
| US4207110A | Diazotype material | Physics | 0 | Expired |
| US5268252A | Radiation-sensitive ester and process for its preparation | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.