Multi zone illuminator with embeded process control sensors and light interference elimination circuit
US5268989A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 16, 1992 |
| Grant date | Dec 7, 1993 |
| Priority date | — |
| Expiry date | Apr 16, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A multi-zone illuminator for processing semiconductor wafers comprises a plurality of source lamps and dummy lamps embedded in the reflector side of a lamp housing. The source lamps are arranged in a plurality of concentric circular zones. The illuminator also comprises plurality of light pipes for receiving multi-point temperature sensors to measure the semiconductor wafer temperature and its distribution uniformity. A gold-plated reflector plate is attached to the bottom side of the lamp housing for reflecting and directing optical energy toward the wafer surface. The distance between the reflector plate and the wafer and the lamps and the wafer may be adjusted with the use of a spacial elevator and adaptor assembly. The multi-zone illuminator allows uniform wafer heating during both transient and steady-state wafer heating cycles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.