Cathodic arc deposition system
US5269896A · kind A · utility
25Cited by
6References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 1992 |
| Grant date | Dec 14, 1993 |
| Priority date | — |
| Expiry date | May 28, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/325
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A cathodic arc deposition system includes a cathode made of a film forming material, a shield surrounding a circumferential side of the cathode with a gap, a vacuum chamber having the cathode and the shield therein, and a substrate to have deposited at a surface thereof an ionized film forming material by generating an arc discharge between the cathode and the anode. Either the cathode or the shield is adjusted in height so as to keep the upper edge of the shield at substantially the same vertical level as the upper edge of the cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.