D.C. reactively sputtered antireflection coatings
US5270858A · kind A · utility
50Cited by
16References
16Claims
0Family size
Inventor
Key dates
| Filing date | Sep 6, 1991 |
| Grant date | Dec 14, 1993 |
| Priority date | — |
| Expiry date | Sep 6, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate. Conductive transparent materials including aluminum doped zinc oxide, antimony doped tin oxide, cadmium tin oxide, and indium tin oxide may be included in the coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.