Patent · US Expired

Method and device for measuring temperature radiation using a pyrometer wherein compensation lamps are used

US5271084A · kind A · utility

28Cited by

16References

14Claims

0Family size

Assignee

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW · BE

Inventors

Peter Vandenabeele · Sint-Amandsberg, BE
Karen Maex · Herent, BE

Key dates

Filing date	Oct 6, 1992
Grant date	Dec 14, 1993
Priority date	—
Expiry date	Oct 6, 2012

Classification

Technology area (CPC G)Physics
CPC primaryG01J2005/066
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Method and apparatus for measuring the radiation originating from one side of a wafer of semiconductor material using a pyrometer, wherein non-blackbody compensation radiation is projected onto that side to compensate for the reflectivity of the wafer of material and wherein the intensity of the non-blackbody compensation radiation is controlled subject to the amount of radiation measured by the pyrometer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.