High accuracy beam blanker
US5276330A · kind A · utility
6Cited by
6References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 29, 1991 |
| Grant date | Jan 4, 1994 |
| Priority date | — |
| Expiry date | May 29, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/045
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The accuracy of a double-deflection beam blanker is dramatically improved for all blanker voltages by using provided, closed-form, trajectory equations to determine the blanker geometric parameters and compensating for fringe-field effects in order to precisely determine the delay line length for control of an electron or ion beam. This delay line length is maintained by placing alignment apertures above and below the blanker.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.