Microwave plasma generating method and apparatus
US5276386A · kind A · utility
28Cited by
12References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 1991 |
| Grant date | Jan 4, 1994 |
| Priority date | — |
| Expiry date | Mar 14, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32192
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a microwave plasma generating method and apparatus according to the present invention, a slow wave structure is disposed in the propagation region of microwaves, and the microwaves are introduced at a delayed phase velocity into a discharge chamber so that treating gases are transformed into plasma. Thus, the phase velocity of the microwaves is adjusted to a relatively low velocity, at which charged particles are distributed most densely in the plasma, so that the energy may be efficiently transformed to many more charged particles in the plasma. Thus, the plasma of high density is generated to improve a plasma treating rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.