Yoshinao Kawasaki
52Patents
17h-index
60Co-inventors
83Inventor score
Filing activity: Jan 5, 1987 → Mar 9, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5855726A | Vacuum processing apparatus and semiconductor manufacturing line using the same | Emerging Cross-Sectional Technologies | 356 | Expired |
| US4795529A | Plasma treating method and apparatus therefor | Electricity | 117 | Expired |
| US5007981A | Method of removing residual corrosive compounds by plasma etching followed by washing | Electricity | 91 | Expired |
| US5868854A | Method and apparatus for processing samples | Electricity | 53 | Expired |
| US4911812A | Plasma treating method and apparatus therefor | Electricity | 36 | Expired |
| US5432315A | Plasma process apparatus including ground electrode with protection film | Electricity | 34 | Expired |
| US5200017A | Sample processing method and apparatus | Electricity | 31 | Expired |
| US5290993A | Microwave plasma processing device | Electricity | 28 | Expired |
| US5276386A | Microwave plasma generating method and apparatus | Electricity | 28 | Expired |
| US6519504B1 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5202275A | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5646489A | Plasma generator with mode restricting means | Electricity | 25 | Expired |
| US5331191A | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Emerging Cross-Sectional Technologies | 22 | Expired |
| US5085750A | Plasma treating method and apparatus therefor | Electricity | 20 | Expired |
| US4936967A | Method of detecting an end point of plasma treatment | Electricity | 19 | Expired |
| US5520771A | Microwave plasma processing apparatus | Electricity | 18 | Expired |
| US5804033A | Microwave plasma processing method and apparatus | Electricity | 18 | Expired |
| US5780882A | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Emerging Cross-Sectional Technologies | 14 | Expired |
| US5433789A | Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves | Electricity | 13 | Expired |
| US5739589A | Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6537415B2 | Apparatus for processing samples | Electricity | 8 | Expired |
| US6046425A | Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber | Electricity | 8 | Expired |
| US5900162A | Plasma etching method and apparatus | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6127255A | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6036816A | Apparatus for processing a sample having a metal laminate | Electricity | 7 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.