Method for supplying and discharging gas to and from semiconductor manufacturing equipment and system for executing the same
US5277215A · kind A · utility
10Cited by
1References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 21, 1993 |
| Grant date | Jan 11, 1994 |
| Priority date | — |
| Expiry date | Jan 21, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86187
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plurality of airtight chambers are connected through blocking means, which can communicate or shut off the chambers, and at least one of the airtight chambers is used as a processing chamber. One of the adjacent airtight chambers is replaced by a replacement gas, and the replacement gas is supplied to the other of the adjacent airtight chambers. When pressure difference or pressure in the two adjacent airtight chambers is below a predetermined value, the adjacent two airtight chambers are communicated, and pressure in the two airtight chambers is equalized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.