Masakazu Shimada
26Patents
7h-index
52Co-inventors
72Inventor score
Filing activity: Jan 21, 1993 → Mar 8, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8501599B2 | Substrate processing apparatus and substrate processing method | Electricity | 452 | Active |
| US6025956A | Incident-light fluorescence microscope | Physics | 112 | Expired |
| US6563634B2 | Microscope with aberration correcting function | Physics | 79 | Expired |
| US6043475A | Focal point adjustment apparatus and method applied to microscopes | Physics | 33 | Expired |
| US5735961A | Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide | Emerging Cross-Sectional Technologies | 21 | Expired |
| US5277215A | Method for supplying and discharging gas to and from semiconductor manufacturing equipment and system for executing the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US8148271B2 | Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing method | Electricity | 9 | Active |
| US5879415A | Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5516436A | Agent for treating textile materials | Textiles; Paper | 5 | Expired |
| US8030599B2 | Substrate processing apparatus, heating device, and semiconductor device manufacturing method | Electricity | 5 | Active |
| US8507296B2 | Substrate processing method and film forming method | Electricity | 4 | Active |
| US11293096B2 | Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer | Electricity | 4 | Active |
| US6034815A | Laser scan microscope | Physics | 3 | Expired |
| US7700054B2 | Substrate processing apparatus having gas side flow via gas inlet | Mechanical Engineering; Lighting; Heating | 3 | Active |
| US7863204B2 | Substrate processing apparatus, heating apparatus for use in the same, method of manufacturing semiconductors with those apparatuses, and heating element supporting structure | Electricity | 2 | Active |
| US9437421B2 | Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium | Chemistry; Metallurgy | 2 | Active |
| US10876207B2 | Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device | Electricity | 2 | Active |
| US8116618B2 | Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices | Electricity | 2 | Active |
| US8158911B2 | Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member | Electricity | 2 | Active |
| US8303712B2 | Substrate processing apparatus, method for manufacturing semiconductor device, and process tube | Electricity | 2 | Active |
| US8876453B2 | Substrate processing apparatus and method of manufacturing semiconductor device | Electricity | 1 | Active |
| US9184069B2 | Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator | Electricity | 1 | Active |
| US11031270B2 | Substrate processing apparatus, substrate holder and mounting tool | Electricity | 1 | Active |
| USD651990S1 | Semiconductor manufacturing equipment | General | 0 | Expired |
| US11970771B2 | Vaporizer, substrate processing apparatus and method for manufacturing semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.