Semiconductor fabrication equipment
US5281295A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Oct 20, 1992 |
| Grant date | Jan 25, 1994 |
| Priority date | — |
| Expiry date | Oct 20, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67207
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor fabrication apparatus includes a plurality of processing stations for film formation or etching, concurrently or continuously. The semiconductor fabrication apparatus is capable of supplying a process gas for film formation or etching from a single gas header to each processing station and provides uniform wafer processing at each processing station. The apparatus includes a process gas supply source; a plurality of branch pipes branched from the common header which, in turn, is connected to a process gas supply source; a plurality of outlet pipes connecting the branch pipes with the processing stations through first flow rate controllers; exhaust pipes also connected to the branch pipes; plural switching valves for switching the flow of process gas between the outlet pipes and the exhaust pipes; and plural second flow rate controllers in the exhaust pipes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.