Patent · US Expired

Electrochemical micromachining tool and process for through-mask patterning of thin metallic films supported by non-conducting or poorly conducting surfaces

US5284554A · kind A · utility

33Cited by
18References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 9, 1992
Grant dateFeb 8, 1994
Priority date
Expiry dateJan 9, 2012

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/07
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

The present invention describes a high speed, high precision electrochemical micromachining tool, chemical solution and method for the one sided through-mask micropatterning of conducting foils and films supported by insulating material. The tool of the present invention can include either a movable plate means allowing for the movement of the workpiece to and fro above the cathode assembly, or a movable cathode assembly means allowing for the movement of said cathode assembly to and fro beneath the workpiece. Said cathode assembly also consists of a nozzle assembly from which the electrolytic solution emerges as electrolytic shower and impinges upon the workpiece. Methods to resolve the problems related to the loss of electrical contact during the electrochemical micromachining process are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.