Pellicle for photolithographic mask
US5286567A · kind A · utility
21Cited by
3References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 13, 1992 |
| Grant date | Feb 15, 1994 |
| Priority date | — |
| Expiry date | Jul 13, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31544
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A pellicle for dust-proofing of a photolithographic mask used for patterning in the manufacturing process of semiconductor devices. The drawback due to dust deposition can be greatly decreased in the use of a pellicle made from a fluorocarbon resin which is a copolymer of tetrafluoroethylene and another fluorocarbon monomer capable of introducing a cyclic perfluoroether group into the molecule when the pellicle film is rendered antistatically hydrophilic, for example, by a plasma treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.