Base developable negative photoresist composition and use thereof

US5286599A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Edward D. Babich · Chappaqua, US
• Eileen A. Galligan · Fishkill, US
• Jeffrey D. Gelorme · Plainville, US
• Richard P. McGouey · Carmel, US
• Sharon L. Nunes · Hopewell Junction, US
• Jurij R. Paraszczak · Pleasantville, US
• Russell J. Serino · Ridgefield, US
• David F. Witman · Pleasantville, US

Key dates

• Filing date: Sep 26, 1991
• Grant date: Feb 15, 1994
• Expiry date: Sep 26, 2011

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/115
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.