David F. Witman
13Patents
8h-index
26Co-inventors
68Inventor score
Filing activity: Mar 19, 1985 → Sep 29, 1994
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4744615A | Laser beam homogenizer | Physics | 161 | Expired |
| US4840923A | Simultaneous multiple level interconnection process | Emerging Cross-Sectional Technologies | 87 | Expired |
| US5258236A | Multi-layer thin film structure and parallel processing method for fabricating same | Emerging Cross-Sectional Technologies | 55 | Expired |
| US5534094A | Method for fabricating multi-layer thin film structure having a separation layer | Emerging Cross-Sectional Technologies | 51 | Expired |
| US4782008A | Plasma-resistant polymeric material, preparation thereof, and use thereof | Physics | 25 | Expired |
| US5059512A | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions | Emerging Cross-Sectional Technologies | 23 | Expired |
| US5286599A | Base developable negative photoresist composition and use thereof | Emerging Cross-Sectional Technologies | 18 | Expired |
| US4981909A | Plasma-resistant polymeric material, preparation thereof, and use thereof | Physics | 9 | Expired |
| US5098816A | Method for forming a pattern of a photoresist | Physics | 8 | Expired |
| US5110711A | Method for forming a pattern | Physics | 7 | Expired |
| US4770947A | Multiple density mask and fabrication thereof | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5115095A | Epoxy functional organosilicon polymer | Physics | 4 | Expired |
| US5238773A | Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups | Physics | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.