Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
US5286602A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 1992 |
| Grant date | Feb 15, 1994 |
| Priority date | — |
| Expiry date | Apr 20, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Compounds having repeating units of the formula I ##STR1## in which R.sup.1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH.sub.2 groups may be replaced by oxygen or sulfur atoms, PA0 R.sup.2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, PA0 R.sup.3 is an alkyl or aryl radical, PA0 X is --CO--, --O--CO-- or --NH--CO--, and PA0 n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.