Walter Spiess
18Patents
8h-index
24Co-inventors
68Inventor score
Filing activity: May 1, 1991 → Apr 9, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5498506A | Positive-acting radiation-sensitive mixture and recording material produced therewith | Physics | 18 | Expired |
| US5424166A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | Physics | 17 | Expired |
| US5364734A | Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5716756A | Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use | Physics | 15 | Expired |
| US5229254A | Positive-working radiation-sensitive mixtures, and radiation-sensitive recording materials produced with these mixtures | Physics | 14 | Expired |
| US5230985A | Negative-working radiation-sensitive mixtures, and radiation-sensitive recording material produced with these mixtures | Physics | 12 | Expired |
| US5356752A | Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5286867A | Substituted 1-sulfonyloxy-2-pyridones and process for preparing them | Physics | 9 | Expired |
| US5286602A | Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture | Emerging Cross-Sectional Technologies | 8 | Expired |
| US5401608A | Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith | Emerging Cross-Sectional Technologies | 8 | Expired |
| US5612164A | Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone | Physics | 6 | Expired |
| US5346804A | Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7431858B2 | Nanoimprint resist | Physics | 5 | Expired |
| US5298364A | Radiation-sensitive sulfonic acid esters and their use | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5346806A | Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5256517A | Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units | Physics | 4 | Expired |
| US6063545A | Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture | Emerging Cross-Sectional Technologies | 1 | Expired |
| US5442061A | Radiation-sensitive sulfonic acid esters and their use | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.