Method and apparatus for checking a mask pattern
US5287290A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 10, 1992 |
| Grant date | Feb 15, 1994 |
| Priority date | — |
| Expiry date | Dec 10, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and an apparatus for checking a mask pattern including a plurality of mask pattern regions formed based on different design pattern rules. The method includes the steps of: defining each of the mask pattern regions as a check object region; setting a defect detection reference corresponding to a respective design pattern rule of the mask pattern regions for each of the check object regions; and detecting presence or absence of defects in the mask pattern based on the respective defect detection reference for each of the check object regions. By these steps, it is possible to realize reduction in check time of the mask pattern and improvement in throughput of the checking apparatus, without necessitating discrimination processing of pseudo defects in the mask pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.