Manufacturing method including photoresist processing using a near-field optical probe
US5288998A · kind A · utility
29Cited by
8References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 6, 1993 |
| Grant date | Feb 22, 1994 |
| Priority date | — |
| Expiry date | Jan 6, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/862
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An optical system useful, e.g., for near-field scanning optical microscopy is provided. The system incorporates a probe having improved properties. In one embodiment, the probe comprises a tapered and partially metallized portion of a single-mode optical fiber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.