Drain arrangement for photoresist coating apparatus
US5289222A · kind A · utility
23Cited by
3References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 26, 1992 |
| Grant date | Feb 22, 1994 |
| Priority date | — |
| Expiry date | Jun 26, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/2506
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist drainage system for conducting the excess photoresist and solvents from a spin coating machine in a semiconductor fabrication unit is disclosed. The excess photoresist liquid and solvents are channeled directly to an exhaust manifold instead of being collected in a temporary storage tank. From the exhaust manifold the photoresist and solvents flow directly into a factory chemical reclaim system. This substantially reduces the amount of solvent vapors that are drawn into the factory exhaust system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.