Apparatus for maximizing light beam utilization
US5290992A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 1992 |
| Grant date | Mar 1, 1994 |
| Priority date | — |
| Expiry date | Oct 7, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention is an apparatus and method for maximizing light beam utilization in patterning applications by positioning a plurality of mask mirrors in the light beam path to form patterned light onto a plurality of work pieces. Each mask mirror is designed so that a portion of the light beam area needed for exposing a work piece to patterned light is reflected from the mask mirror, while the remainder is passed through the mask mirror to another mask mirror. Alternatively, each mask mirror can be designed so that a portion of the light beam area needed for exposing a work piece to patterned light is passed through the mask mirror, while the remainder is reflected to another mask mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.