Sputtering unit
US5292419A · kind A · utility
14Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1992 |
| Grant date | Mar 8, 1994 |
| Priority date | — |
| Expiry date | Mar 24, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/566
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a sputtering unit with an electrode (3) and a target (2) connected with this electrode (3) wherein this target (2) is interchangeable. Herein a consumed target (2) is replaced by a fresh and pre-sputtered target (7) thereby that the complete electrode (3) is replaced by a new electrode (6).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.