Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive
US5300348A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 8, 1992 |
| Grant date | Apr 5, 1994 |
| Priority date | — |
| Expiry date | Oct 8, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improvement is proposed in a frame-supported pellicle consisting of a frame member and a thin transparent polymer membrane adhesively bonded to the frame member used for dustproof covering of a photomask in a photolithograpic patterning work of electronic devices. The improvement comprises using a specific fluorocarbon group-containing organosiloxane-based polymeric composition as an adhesive for adhesively bonding the frame member and the polymer membrane. This adhesive is effective even when the polymeric membrane is formed from a fluorocarbon polymer which is hardly susceptible to adhesive bonding with conventional adhesives. In addition, the adhesive bonding by use of this specific adhesive is highly durable even under irradiation with ultraviolet light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.