Apparatus and method for uniform microwave plasma processing using TE.sub.1 1 .sub.01 modes
US5302803A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1991 |
| Grant date | Apr 12, 1994 |
| Priority date | — |
| Expiry date | Dec 23, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus and method using a predetermined proportion of relative power between a TE.sub.11 mode and a TM.sub.01 mode to produce radial uniformity of the plasma. A microwave coupler transforms microwave energy from a microwave source into approximately equal proportions of TE.sub.11 and TM.sub.01 modes. In one embodiment, the coupler includes a first arm for generating the TE.sub.11 mode and a second arm for generating the TM.sub.01 mode which are then combined in a cylindrical waveguide section having a sufficient inner diameter to support propagation of both modes. Other circuit components are provided to prevent cross-coupling of the TE.sub.11 mode into the TM.sub.01 generating arm, and vice versa. Thus, the relative proportion of power of each mode may be independently controlled. A magnetic field generator may be used in the apparatus to create an electron cyclotron resonance condition within the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.