Illumination method, illumination apparatus and projection exposure apparatus
US5302999A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 1993 |
| Grant date | Apr 12, 1994 |
| Priority date | — |
| Expiry date | Jan 27, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/4296
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus comprises a light source for emitting a light beam for exposure; an illumination optical system comprising optical fiber bundle portion including a plurality of bundled optical fibers having an entrance plane to which a light beam exiting from the exposing light source is incident, and a little optical fiber bundle portion including a plurality of little optical fiber bundles respectively having an outgoing plane; and an projection exposure system for projecting a light beam passing through the illumination optical system and transmitting a mask or a reticle onto an object to be exposed as a pattern image of the mask or the reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.