Radio frequency induction/multipole plasma processing tool
US5304279A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 1992 |
| Grant date | Apr 19, 1994 |
| Priority date | — |
| Expiry date | Sep 28, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32688
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A dry processing apparatus for plasma etching or deposition includes a chamber for plasma processing having an external wall for housing a work piece with a surface to be plasma processed. A source of an induction field is located outside the chamber on its opposite side from the work piece. A radio frequency induction field applied to the chamber generates a plasma. The plasma is confined within the external wall in the chamber by magnetic dipoles providing a surface magnetic field for confining the plasma. The surface magnetic field is confined to the space adjacent to the external wall. An R.F. generator provides an R.F. generated bias to the work piece. The chamber is lined with a material inert to a plasma or noncontaminating to the work piece, and the induction source in the form of a spiral or involute shaped induction coil is located on the exterior of the liner material on the opposite side of the chamber from the work piece. Distribution of gas to the chamber is uniform because a manifold located about the periphery of the chamber and an orifice formed by the surface of the chamber and the manifold admits gas from the manifold into the chamber at a uniform pressure about …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.