Projection exposure apparatus
US5309197A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 1992 |
| Grant date | May 3, 1994 |
| Priority date | — |
| Expiry date | Apr 15, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus includes a projection lens system for projecting an image of a pattern of an original on a substrate having a photosensitive layer, by using a sensitizing beam; a first detection optical system for detecting a mark of the substrate through the projection lens system and with a first non-sensitizing beam, the first detection optical system producing first information related to the position of the mark; a second detection optical system for detecting the mark of the substrate without the projection lens system and with a second nonsensitizing beam having a bandwidth broader than that of the first non-sensitizing beam, the second detection optical system producing second information related to the position of the mark; and a detector for detecting an error included in the first information, by using the first and second information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.