Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
US5310619A · kind A · utility
99Cited by
11References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 13, 1992 |
| Grant date | May 10, 1994 |
| Priority date | — |
| Expiry date | May 13, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photoresist composition is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.