Metal ion source and a method of producing metal ions
US5315121A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1991 |
| Grant date | May 24, 1994 |
| Priority date | — |
| Expiry date | Dec 13, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
For simplifying the structure of a metal ion source, in particular for imnting into semiconductor wafers small doses of metals which are hard to vaporize, the metal ion source includes an electrically heatable thermionic cathode in the form of a heating wire within an ion chamber, the heating wire being arranged adjacent a metallic component, which consists of the metal intended to give off the metal ions, and being essentially at the potential of the metallic component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.