Sub-micron device fabrication using multiple aperture filter
US5316879A · kind A · utility
17Cited by
0References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 1992 |
| Grant date | May 31, 1994 |
| Priority date | — |
| Expiry date | Jul 14, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Fabrication of sub-micron design rule integrated circuits entails imposition of patterning information, consisting of degree of scattering, on a projected scanning beam of accelerated electrons by means of a mask, imaging being dependent upon passage through a back focal plane filter including a plurality of apertures for selectively passing relatively unscattered electrons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.