Substrate supporting apparatus
US5318634A · kind A · utility
18Cited by
19References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 1991 |
| Grant date | Jun 7, 1994 |
| Priority date | — |
| Expiry date | Feb 14, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A rotatable shaft supports and imparts rotary motion to a susceptor supporting spider to locate the susceptor and any substrate mounted thereon within a reaction chamber during a CVD process. The spider includes a plurality of radially extending arms having upwardly directed pegs for engaging cavities in the underside of the susceptor and a hub for interconnection with the rotatable shaft.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.