Control of plasma process by use of harmonic frequency components of voltage and current
US5325019A · kind A · utility
59Cited by
25References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 1992 |
| Grant date | Jun 28, 1994 |
| Priority date | — |
| Expiry date | Aug 21, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention provides for a technique for taking advantage of the intrinsic electrical non-linearity of processing plasmas to add additional control variables that affect process performance. The technique provides for the adjustment of the electrical coupling circuitry, as well as the electrical excitation level, in response to measurements of the reactor voltage and current and to use that capability to modify the plasma characteristics to obtain the desired performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.