High purity cleaning system
US5326035A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 4, 1992 |
| Grant date | Jul 5, 1994 |
| Priority date | — |
| Expiry date | Sep 4, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S239/19
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of cleaning under high temperature and high pressure and cleaning equipment to be used in a cleaning process now being employed in such industrial fields as the electronics industry centering around the semiconductor industry and the optical machine industry. The high temperature/high pressure cleaning equipment has at least a compressing pump, a heating device, a nozzle, and piping, and, in the cleaning equipment to inject high temperature/high pressure water from a nozzle to the matter to be cleaned, functions to inject high temperature/high pressure ultrapure water from the nozzle to the matter to be cleaned. Cleaning is carried out by injecting ultrapure water having a relative resistance of 17.0 M/l-cm or more when converted at 25.degree. C. to a matter to be cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.