Integrated light deflector and method of fabrication therefor
US5327415A · kind A · utility
10Cited by
7References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1993 |
| Grant date | Jul 5, 1994 |
| Priority date | — |
| Expiry date | Dec 23, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An integrated light deflector and fabrication method are disclosed. In accordance with the method, a mold is constructed above the surface of a substrate using a thick photo resist and a mask to define a deflector plane. A collimated light beam is applied at an appropriate angle of incidence to the photo resist material and mask. The developed resist provides a mold into which the deflector body is cast, leaving a deflector body whose front surface serves as the deflecting surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.