Exposure apparatus and method
US5329333A · kind A · utility
29Cited by
6References
48Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 5, 1992 |
| Grant date | Jul 12, 1994 |
| Priority date | — |
| Expiry date | Mar 5, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.