Micromachining process for making perfect exterior corner in an etchable substrate
US5338400A · kind A · utility
14Cited by
9References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 25, 1993 |
| Grant date | Aug 16, 1994 |
| Priority date | — |
| Expiry date | Feb 25, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3083
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for forming a three-dimensional structure etched in a substrate with perfect convex corners includes partitioning the structure into two features such that the exterior corners are formed by the intersection of the two features; etching the first feature; forming an etch mask on the surface and on the substrate of the etched first feature; opening a window in the etch mask on the substrate to define the second feature; and etching the second feature, thereby obtaining the desired structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.