Langmuir probe system for radio frequency excited plasma processing system
US5339039A · kind A · utility
23Cited by
4References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1992 |
| Grant date | Aug 16, 1994 |
| Priority date | — |
| Expiry date | Sep 29, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A Langmuir probe system for measuring plasma internal discharge parameters in a radio frequency excited plasma processing system includes an electrically tuned resonant circuit. The electrically tuned resonant circuit includes a semiconductor variable capacitor. Specifically, an inductor and FET are connected in parallel to form a resonant circuit used to electrically tune the Langmuir probe. The tuning circuit is placed within a moveable, electrically floating, probe housing and is electrically tuned to improve tuning accuracy and to reduce detuning during operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.