Method for plasma jet deposition
US5342660A · kind A · utility
33Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 1991 |
| Grant date | Aug 30, 1994 |
| Priority date | — |
| Expiry date | May 10, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/513
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The disclosure is directed to a method for depositing a substance, such as synthetic diamond. A plasma beam is produced, and contains the constituents of the substance to be deposited. A substrate is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substance is deposited on the surface. The substrate, the beam, or both can be moved. Spinning of the substrate, with the beam non-concentric thereon, is one of the disclosed techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.