Deep UV sensitive photoresist resistant to latent image decay

US5342734A · kind A · utility

Assignee

• Morton International, Inc. · US

Inventors

• Richard M. Lazarus · Mission Viejo, US
• John Grunwald · Ramat Gan, IL
• Chava Gal · Ramat HaSharon, IL
• Shulamit Hirsch · Nes Ziona, IL

Key dates

• Filing date: May 13, 1992
• Grant date: Aug 30, 1994
• Expiry date: May 13, 2012

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photoinitiator which generates acid upon exposure to actinic radiation, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium.