Ellipsometer

US5343293A · kind A · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Rudolf Berger · Marloffstein, DE
• Heiner Ryssel · Spardorf, DE
• Claus Schneider · Burgsinn, DE
• Wolfgang Aderhold · Cupertino, US

Key dates

• Filing date: Oct 23, 1992
• Grant date: Aug 30, 1994
• Expiry date: Oct 23, 2012

Classification

• Technology area (CPC G): Physics
• CPC primary: G01B11/065
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

An ellipsometer, used in particular for measuring the thickness of oxide films on silicon wafers inside an oven, comprising an analyzer unit (3), a beam deflection device, a paddle and a ploarizer unit (2). In order to increase the measurement precision, the ellipsometer is designed so that the beam deflection device comprises two prisms (6, 9), the prisms (6,9), the analyzer unit (3) and the polarizer unit (2) are mounted on the paddle (11), and two tubes (4, 10) are provided for guiding the beam from the polarizer unit (2) to the first prism (6) and from the second prism (9) to the analyzer unit (3) .