Inventor · Cupertino, CA, US

Wolfgang Aderhold

53Patents
8h-index
61Co-inventors
81Inventor score

Filing activity: Oct 23, 1992 → Nov 27, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US6215106A Thermally processing a substrate Chemistry; Metallurgy 44 Expired
US5343293A Ellipsometer Physics 26 Expired
US6164816A Tuning a substrate temperature measurement system Physics 24 Expired
US8111978B2 Rapid thermal processing chamber with shower head Electricity 15 Active
US8314371B2 Rapid thermal processing chamber with micro-positioning system Electricity 14 Active
US6803546B1 Thermally processing a substrate Electricity 12 Expired
US7398693B2 Adaptive control method for rapid thermal processing of a substrate Electricity 11 Active
US7414224B2 Backside rapid thermal processing of patterned wafers Mechanical Engineering; Lighting; Heating 9 Active
US8104951B2 Temperature uniformity measurements during rapid thermal processing Physics 8 Active
US8900889B2 Rapid thermal processing chamber with micro-positioning system Electricity 8 Active
US9245768B2 Method of improving substrate uniformity during rapid thermal processing Electricity 7 Active
US9390950B2 Rapid thermal processing chamber with micro-positioning system Electricity 7 Active
US9018110B2 Apparatus and methods for microwave processing of semiconductor substrates Electricity 5 Active
US8109669B2 Temperature uniformity measurement during thermal processing Physics 5 Active
US8249436B2 System for non radial temperature control for rotating substrates Electricity 5 Active
US8724977B2 System for non radial temperature control for rotating substrates Electricity 4 Active
US8865602B2 Edge ring lip Electricity 4 Active
US9564349B2 Rapid thermal processing chamber with micro-positioning system Electricity 3 Active
US8658945B2 Backside rapid thermal processing of patterned wafers Mechanical Engineering; Lighting; Heating 3 Active
US9728471B2 System for non radial temperature control for rotating substrates Electricity 3 Active
US9431278B2 Backside rapid thermal processing of patterned wafers Mechanical Engineering; Lighting; Heating 2 Active
US7778533B2 Semiconductor thermal process control Electricity 2 Expired
US7195934B2 Method and system for deposition tuning in an epitaxial film growth apparatus Emerging Cross-Sectional Technologies 2 Expired
US10741457B2 System for non radial temperature control for rotating substrates Electricity 2 Active
US7667162B2 Semiconductor thermal process control utilizing position oriented temperature generated thermal mask Electricity 1 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.