Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture

US5346804A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Geog Pawlowski · Wiesbaden, DE
• Ralph R. Dammel · Flemington, US
• Horst Roeschert · Ober-Hilbersheim, DE
• Walter Spiess · Dieburg, DE
• Charlotte Eckes · Mainz, DE

Key dates

• Filing date: Apr 20, 1992
• Grant date: Sep 13, 1994
• Expiry date: Apr 20, 2012

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/126
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter ##STR1## in which R.sup.1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical, PA1 R.sup.2 is a hydrogen atom, an unsubstituted or substituted alkyl radical, or an unsubstituted or substituted aryl radical, (R.sup.1 --SO.sub.2 --O--).sub.n X--, or R.sub.3 O--, PA1 R.sup.3 and R.sup.4 are identical or different and are unsubstituted or substituted alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals, in which 1 to 3 aliphatic CH.sub.2 or CH groups are optionally replaced by one or more of NR.sup.5, O, S, CO, CO--O, CO--NH, O--CO--NH, CO--NH--CO, NH--CO--NH, SO.sub.2, SO.sub.2 --O or SO.sub.2 --NH, or unsubstituted or substituted alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals, or R.sup.3 and R.sup.4 are mutually linked to form an unsubstituted or substituted heterocyclic ring, PA1 R.sup.5 is an acyl radical, PA1 n is an integer from 1 to 3, and PA1 X is an alkylene, cyloalkylene, or arylene group. and which, in combination with alkali-soluble binders, give positive-working mixtur…